Title :
Using a statistical experimental design to optimize a phosphorus deposition process in a high volume production facility
Author :
Fearon, Paul ; Caldwell, Bill
Author_Institution :
Nat. Semicond., South Portland, ME, USA
fDate :
30 Sep-1 Oct 1992
Abstract :
In this study a statistically designed experiment was first used to improve the uniformity of an existing reactor. Three factors were examined in combination in an 8×8 resolution V experiment. Uniformity was noticeably improved on a batch size that was increased from 50 to the minimum goal of 75 wafers. The result of this first experiment did not achieve the process goal, since the uniformities remained unremarkable at 10.9 Ω/sq. across the load, so a different reactor design was tested. Two factors were tested in combination in an experiment using this reactor. Uniformity was improved to 2.2 Ω/sq. across a load size of 125 wafers, which was 67% above the goal
Keywords :
batch processing (industrial); chemical vapour deposition; phosphorus compounds; semiconductor technology; statistical analysis; PxOy; batch size; deposition process; high volume production facility; load size; reactor design; statistical experimental design; uniformity; Design engineering; Design for experiments; Design optimization; Fluid flow; Furnaces; Inductors; Optimization methods; Production facilities; Silicon; Testing;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-0740-2
DOI :
10.1109/ASMC.1992.253781
