DocumentCode :
3418197
Title :
Effects of metal coverage on MOSFET matching
Author :
Tuinhout, H. ; Pelgrom, M. ; Penning de Vries, R. ; Vertregt, M.
Author_Institution :
Philips Res., Eindhoven, Netherlands
fYear :
1996
fDate :
8-11 Dec. 1996
Firstpage :
735
Lastpage :
738
Abstract :
Using dedicated MOSFET matching test structures, this paper demonstrates that performance of analog as well as digital circuit blocks can degrade dramatically in multi level metal CMOS processes when transistors are covered with metal. An optimized back-end treatment improved the MOSFET matching significantly.
Keywords :
CMOS integrated circuits; MOSFET; integrated circuit metallisation; integrated circuit testing; MOSFET matching; analog circuit blocks; dedicated matching test structures; digital circuit blocks; metal coverage; multilevel metal CMOS processes; optimized back-end treatment; performance degradation; CMOS process; Capacitors; Circuit testing; Converters; Degradation; Electronic components; MOSFET circuits; Matched filters; Silicon; Solids;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-3393-4
Type :
conf
DOI :
10.1109/IEDM.1996.554085
Filename :
554085
Link To Document :
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