Title :
A step-gate-oxide SOI MOSFET for RF power amplifiers in short- and medium-range wireless applications
Author :
Xiaoping Liao ; Tsui, K.K.P. ; Haitao Liu ; Chen, K.J. ; Sin, J.K.O.
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Abstract :
We propose and demonstrate a low-cost CMOS-compatible step-gate-oxide (SGO) SOI MOSFET that is suitable for RF power amplifiers in short- and medium-range wireless applications. The device structure and fabrication are identical to those of the standard SOI MOS devices except that the gate oxide features a step structure that consists of a thin oxide region on the source side and a thick oxide region on the drain side. A well-designed and optimized SGO SOI MOSFET with appropriate thin/thick gate length ratio exhibits improved breakdown voltage without adverse effects on the drain current characteristics. The step-gate-oxide structure also features reduced gate capacitances, leading to higher cutoff frequencies. The SGO MOSFET power amplifiers can be integrated with other CMOS-based RF blocks for single-chip RF transceivers.
Keywords :
MOSFET; capacitance; microwave field effect transistors; microwave power transistors; power MOSFET; semiconductor device breakdown; silicon-on-insulator; RF power amplifiers; Si; breakdown voltage; cutoff frequencies; drain current characteristics; gate capacitances; gate length ratio; gate oxide; step-gate-oxide SOI MOSFET; thick oxide region; thin oxide region; wireless applications; Capacitance; Cutoff frequency; Fabrication; MOS devices; MOSFET circuits; Power MOSFET; Power amplifiers; Radio frequency; Radiofrequency amplifiers; Transceivers;
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems, 2003. Digest of Papers. 2003 Topical Meeting on
Conference_Location :
Grainau, Germany
Print_ISBN :
0-7803-7787-7
DOI :
10.1109/SMIC.2003.1196662