DocumentCode :
3418684
Title :
Simultaneous in-situ measurement of film thickness and temperature by using multiple wavelength pyrometric interferometry (MWPI)
Author :
Boebel, Friedrich G. ; Möller, Heino
Author_Institution :
Fraunhofer Gesellschaft, Inst. for Integrated Circuits, Erlangen, Germany
fYear :
1992
fDate :
30 Sep-1 Oct 1992
Firstpage :
67
Lastpage :
71
Abstract :
An optical in situ method for simultaneous film thickness and temperature measurements is discussed. Multiple-wavelength pyrometric interferometry (MWPI) is capable of high resolution (0.5 nm for thickness and 0.05 K for temperature) and real-time data evaluation. It can be used for process control as well as in situ quality inspection without time delay or additional handling mechanisms and is suitable for monitoring single films as well as multilayer structures. MWPI is insensitive to vibration, rotation and misalignment of the wafer. Due to its optical basis it is also insensitive to hostile environments like high temperature and/or chemically reactive gases. The physical basis of MWPI is outlined as well as the necessary steps of the evaluation procedure. Simultaneous film thickness and temperature measurement during the thermal oxidation of Si is presented. The potential technical impact of MWPI on automation, reliability and long-term performance of semiconductor manufacturing is discussed
Keywords :
process control; pyrometers; quality control; spectral methods of temperature measurement; thickness measurement; MWPI; chemically reactive gases; film thickness; hostile environments; multiple wavelength pyrometric interferometry; optical in situ method; process control; quality inspection; real-time data evaluation; reliability; temperature measurements; thermal oxidation; Delay effects; Inspection; Manufacturing automation; Monitoring; Nonhomogeneous media; Optical films; Optical interferometry; Process control; Temperature measurement; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-0740-2
Type :
conf
DOI :
10.1109/ASMC.1992.253839
Filename :
253839
Link To Document :
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