DocumentCode :
3418786
Title :
A monolithic multi-finger nanodiamond lateral vacuum microtriode
Author :
Ghosh, Nirnay ; Kang, W.P. ; Hsu, S.H. ; Raina, S.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA
fYear :
2013
fDate :
8-12 July 2013
Firstpage :
1
Lastpage :
2
Abstract :
This article reports a vacuum multi-finger monolithic microtriode utilizing nanodiamond as the emitting material. The structure is comprised of 140-fingerlike nanodiamond emitters with built-in nanodiamond gate and Si anode. A mixed lithography patterning approach is used to fabricate the three-terminal device structure. Triode characteristics, demonstrating gate controlled emission current modulation at low operating gate and anode voltages, are obtained. The realization of the efficient monolithic microtriode allows further development of robust vacuum integrated circuit for application in high temperature and radiation harsh environments.
Keywords :
diamond; elemental semiconductors; lithography; monolithic integrated circuits; nanoelectronics; radiation hardening (electronics); silicon; triodes; vacuum microelectronics; Si; anode voltage; emitting material; fingerlike nanodiamond emitters; gate controlled emission current modulation; gate voltage; mixed lithography patterning approach; monolithic microtriode; monolithic multifinger nanodiamond lateral vacuum microtriode; nanodiamond gate; radiation harsh environments; three-terminal device structure; triode characteristics; vacuum integrated circuit; Anodes; Field emission; Microtriode; Nanodiamond; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2013 26th International
Conference_Location :
Roanoke, VA
Type :
conf
DOI :
10.1109/IVNC.2013.6624729
Filename :
6624729
Link To Document :
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