Title :
Optically modulated electron emission from nanocrystalline silicon based metal-oxide-semiconductor cathodes
Author :
Shimawaki, Hidetaka ; Neo, Yoichiro ; Mimura, Hidenori ; Wakaya, Fujio ; Takai, Mineo
Author_Institution :
Dept. of Syst. & Inf. Eng., Hachinohe Inst. of Technol., Hachinohe, Japan
Abstract :
The photoresponse of electron emission from metal-oxide-semiconductor (MOS) cathodes based on nanocrystalline silicon is experimentally studied for optically generating a train of short electron bunches. Nanocrystalline silicon film was prepared by pulsed laser ablation using an Nd:YAG laser with the fourth harmonic (266 nm). We obtained a pulsed electron beam from the cathode device modulated by 405-nm laser pulses. The photoresponse in the cathode device was faster than submicrosecond.
Keywords :
MIS devices; cathodes; chemical lasers; electron beam effects; electron field emission; laser ablation; nanostructured materials; yttrium compounds; MOS cathodes; Nd:YAG laser; YAG:Nd; cathode device; fourth harmonic; laser pulses; nanocrystalline silicon based metal-oxide-semiconductor cathodes; nanocrystalline silicon film; optically modulated electron emission; photoresponse; pulsed electron beam; pulsed laser ablation; short electron bunches; Optical sensors; MOS cathode; nanocrystalline silicon; photo-modulated electron beam; photoresponse;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2013 26th International
Conference_Location :
Roanoke, VA
DOI :
10.1109/IVNC.2013.6624752
