DocumentCode
3419438
Title
The field emission of graphene films reduced by laser treatment
Author
Wenbo Cai ; Jianlong Liu ; Zhiwei Peng ; Baoqing Zeng
Author_Institution
Nat. Key Lab. of Sci. & Technol. on Vacuum Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
fYear
2013
fDate
8-12 July 2013
Firstpage
1
Lastpage
2
Abstract
In this study, infrared laser has been employed to reduce graphene oxide films prepared by electrophoretic deposition. The field emission performance of laser reduction of graphene oxide (lrGO) films was remarkably enhanced. For comparison, chemical reduction of graphene oxide (crGO) films were deposited in the same condition, but they were reduced by a hydrazine hydrate process. It was found that both the turn-on and threshold field of sample of lrGO were much lower than that of crGO.
Keywords
electrophoresis; field emission; graphene; laser deposition; chemical reduction; electrophoretic deposition; field emission performance; graphene oxide films; hydrazine hydrate process; infrared laser; laser reduction; laser treatment; Graphene; field emission; graphene films; graphene oxide; laser treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2013 26th International
Conference_Location
Roanoke, VA
Type
conf
DOI
10.1109/IVNC.2013.6624756
Filename
6624756
Link To Document