Title :
The field emission of graphene films reduced by laser treatment
Author :
Wenbo Cai ; Jianlong Liu ; Zhiwei Peng ; Baoqing Zeng
Author_Institution :
Nat. Key Lab. of Sci. & Technol. on Vacuum Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
In this study, infrared laser has been employed to reduce graphene oxide films prepared by electrophoretic deposition. The field emission performance of laser reduction of graphene oxide (lrGO) films was remarkably enhanced. For comparison, chemical reduction of graphene oxide (crGO) films were deposited in the same condition, but they were reduced by a hydrazine hydrate process. It was found that both the turn-on and threshold field of sample of lrGO were much lower than that of crGO.
Keywords :
electrophoresis; field emission; graphene; laser deposition; chemical reduction; electrophoretic deposition; field emission performance; graphene oxide films; hydrazine hydrate process; infrared laser; laser reduction; laser treatment; Graphene; field emission; graphene films; graphene oxide; laser treatment;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2013 26th International
Conference_Location :
Roanoke, VA
DOI :
10.1109/IVNC.2013.6624756
