Title :
High frequency microelectromechanical IF filters
Author :
Bannon, F.D., III ; Clark, J.R. ; Nguyen, C.T.-C.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Abstract :
High frequency, IC-compatible microelectromechanical IF filters with integrated filter Q´s in the hundreds have been demonstrated using a polysilicon surface micromachining technology. These filters are comprised of two micromechanical resonators coupled by soft mechanical springs. The center frequency of a given filter is determined by the resonance frequency of the constituent resonators, while the bandwidth is determined by the coupling spring dimensions and its location between the resonators. By taking advantage of low velocity spring coupling locations, high filter Q´s are attainable despite the use of low mass micro-scale resonator elements. Filter center frequencies from 3-10 MHz with Q´s from 10-400 are demonstrated using low velocity designs.
Keywords :
Q-factor; band-pass filters; micromachining; micromechanical resonators; passive filters; resonator filters; 3 to 10 MHz; IC-compatible filters; Si; coupling spring dimensions; high frequency filters; high-Q filters; low mass micro-scale resonator elements; low velocity spring coupling locations; microelectromechanical IF filters; micromechanical resonators; polysilicon surface micromachining technology; resonance frequency; soft mechanical springs; Band pass filters; Bandwidth; Crystallization; Micromachining; Resonant frequency; Resonator filters; Silicon; Springs; Transceivers; Voltage;
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-3393-4
DOI :
10.1109/IEDM.1996.554094