DocumentCode
3420091
Title
High frequency microelectromechanical IF filters
Author
Bannon, F.D., III ; Clark, J.R. ; Nguyen, C.T.-C.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fYear
1996
fDate
8-11 Dec. 1996
Firstpage
773
Lastpage
776
Abstract
High frequency, IC-compatible microelectromechanical IF filters with integrated filter Q´s in the hundreds have been demonstrated using a polysilicon surface micromachining technology. These filters are comprised of two micromechanical resonators coupled by soft mechanical springs. The center frequency of a given filter is determined by the resonance frequency of the constituent resonators, while the bandwidth is determined by the coupling spring dimensions and its location between the resonators. By taking advantage of low velocity spring coupling locations, high filter Q´s are attainable despite the use of low mass micro-scale resonator elements. Filter center frequencies from 3-10 MHz with Q´s from 10-400 are demonstrated using low velocity designs.
Keywords
Q-factor; band-pass filters; micromachining; micromechanical resonators; passive filters; resonator filters; 3 to 10 MHz; IC-compatible filters; Si; coupling spring dimensions; high frequency filters; high-Q filters; low mass micro-scale resonator elements; low velocity spring coupling locations; microelectromechanical IF filters; micromechanical resonators; polysilicon surface micromachining technology; resonance frequency; soft mechanical springs; Band pass filters; Bandwidth; Crystallization; Micromachining; Resonant frequency; Resonator filters; Silicon; Springs; Transceivers; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location
San Francisco, CA, USA
ISSN
0163-1918
Print_ISBN
0-7803-3393-4
Type
conf
DOI
10.1109/IEDM.1996.554094
Filename
554094
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