Title :
Three dimensional metal micromachining: A disruptive technology for millimeter-wave filters
Author :
Reid, J. Robert ; Oliver, J. Marcus ; Vanhille, Ken ; Sherrer, David
Author_Institution :
NUVOTRONICS, LLC, Radford, VA, USA
Abstract :
The development of silicon based integrated circuits has reached a point where a large portion of an RF system can be integrated onto a single die. However, to create complete RF/millimeter-wave systems, it is necessary to integrate this silicon die with several high performance passive components. Specifically, silicon integrated circuits tend to have limited performance for the design of transmission lines, filters, and antennas. The Polystrata process is a three dimensional metal micromachining process that addresses these weaknesses by providing monolithic fabrication of high performance passives. When applied to filters and upper microwave and millimeter-wave frequencies, metal micromachining can provide filter performance comparable with that of waveguide technology but 10-100× smaller. In this presentation, we will provide details of the Polystrata process, and show the performance that can be achieved with filters fabricated using this technology.
Keywords :
micromachining; microwave filters; millimetre wave filters; passive filters; silicon; waveguide filters; Polystrata process; Si; disruptive technology; high performance passive component; microwave wave frequency; millimeter wave filter; millimeter wave frequency; monolithic fabrication; silicon die; three dimensional metal micromachining process; Band pass filters; Metals; Microwave filters; Patch antennas; Resonator filters; Silicon; Ceramics; coaxial resonators; delay; delay-lines; filters; power amplifiers;
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems (SiRF), 2012 IEEE 12th Topical Meeting on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4577-1317-0
DOI :
10.1109/SiRF.2012.6160165