Title :
Simulation and analysis of low-energy electron beam lithography on topographical substrates
Author :
Peng Wu ; Zai-Fa Zhou ; Jiang-Yong Pan ; Qi Gan ; Wen-Qin Xu
Author_Institution :
Dept. of Electron. Sci. & Technol., Southeast Univ., Nanjing, China
fDate :
Oct. 29 2012-Nov. 1 2012
Abstract :
Monte Carlo method is utilized to simulate low-energy electron-beam (e-beam) lithography over a flat or a topographical substrate with uneven resist surface. The electron scattering trajectories and three-dimensional (3-D) development profiles on a flat or a topographical substrate have been revealed. Simulations of line scan over a topographical step and uneven resist have shown a line “swelling” effect. The line “swelling” effect is more obviously affected by uneven resist surface than substrate topography in the low-energy e-beam lithography. Dose control method can reduce the line swelling effect effectively.
Keywords :
Monte Carlo methods; electron beam lithography; resists; swelling; Monte Carlo method; dose control; electron scattering trajectory; flat substrate; line swelling effect; low-energy electron beam lithography; three-dimensional development profiles; topographical substrates; uneven resist surface; Electron beams; Lithography; Resists; Scattering; Substrates; Surface topography; Electron beam lithography; Low-energy; Monte Carlo; Topographical Substrate;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4673-2474-8
DOI :
10.1109/ICSICT.2012.6467867
