• DocumentCode
    3420841
  • Title

    Statistical leakage estimation of bounds on nanometric CMOS circuits

  • Author

    Vázquez, Raymundo Mendoza

  • Author_Institution
    Dept. d´´Eng. Electron., Univ. Politec. de Catalunya, Barcelona
  • fYear
    2009
  • fDate
    6-9 April 2009
  • Firstpage
    58
  • Lastpage
    63
  • Abstract
    In this work is presented one method of statistical leakage estimation of bounds in CMOS circuits based on the characterization of standard CMOS cell libraries. The leakage estimation takes in account the correlations (rho) of cells structure, input patters and variations on principal process parameters. Also it was considered the presence of Intra-Die process variations for spatial correlations beta = 1 and 0 larr beta rarr 1. For the complete ISCAS85 Benchmark under study the mu and sigma2 absolute errors varies between 0.0048 to 0.1278 & 0.0301 to 0.3801 for lower bound and 0.0306 to 0.1247 & 0.0411 to 0.2016 for upper bound.
  • Keywords
    CMOS integrated circuits; leakage currents; nanoelectronics; semiconductor process modelling; ISCAS85 Benchmark; cells structure; input patters; intra-die process; nanometric CMOS circuits; principal process parameter variations; statistical leakage estimation; CMOS process; CMOS technology; Circuits; Doping profiles; Gate leakage; Leakage current; Libraries; Semiconductor device modeling; Table lookup; Upper bound; Leakage Currents; Leakage Estimation; Statistical Leakage Bounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design & Technology of Integrated Systems in Nanoscal Era, 2009. DTIS '09. 4th International Conference on
  • Conference_Location
    Cairo
  • Print_ISBN
    978-1-4244-4320-8
  • Electronic_ISBN
    978-1-4244-4321-5
  • Type

    conf

  • DOI
    10.1109/DTIS.2009.4938024
  • Filename
    4938024