DocumentCode
3420841
Title
Statistical leakage estimation of bounds on nanometric CMOS circuits
Author
Vázquez, Raymundo Mendoza
Author_Institution
Dept. d´´Eng. Electron., Univ. Politec. de Catalunya, Barcelona
fYear
2009
fDate
6-9 April 2009
Firstpage
58
Lastpage
63
Abstract
In this work is presented one method of statistical leakage estimation of bounds in CMOS circuits based on the characterization of standard CMOS cell libraries. The leakage estimation takes in account the correlations (rho) of cells structure, input patters and variations on principal process parameters. Also it was considered the presence of Intra-Die process variations for spatial correlations beta = 1 and 0 larr beta rarr 1. For the complete ISCAS85 Benchmark under study the mu and sigma2 absolute errors varies between 0.0048 to 0.1278 & 0.0301 to 0.3801 for lower bound and 0.0306 to 0.1247 & 0.0411 to 0.2016 for upper bound.
Keywords
CMOS integrated circuits; leakage currents; nanoelectronics; semiconductor process modelling; ISCAS85 Benchmark; cells structure; input patters; intra-die process; nanometric CMOS circuits; principal process parameter variations; statistical leakage estimation; CMOS process; CMOS technology; Circuits; Doping profiles; Gate leakage; Leakage current; Libraries; Semiconductor device modeling; Table lookup; Upper bound; Leakage Currents; Leakage Estimation; Statistical Leakage Bounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Design & Technology of Integrated Systems in Nanoscal Era, 2009. DTIS '09. 4th International Conference on
Conference_Location
Cairo
Print_ISBN
978-1-4244-4320-8
Electronic_ISBN
978-1-4244-4321-5
Type
conf
DOI
10.1109/DTIS.2009.4938024
Filename
4938024
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