DocumentCode :
3421231
Title :
Quantum compact model for ballistic double gate MOSFETs
Author :
El Sabbagh, M. ; Fikry, W. ; Omar, O.A.
Author_Institution :
Dept. of Eng. Phys. & Math., Ain Shams Univ., Cairo
fYear :
2009
fDate :
6-9 April 2009
Firstpage :
144
Lastpage :
146
Abstract :
A proposed compact model including quantum confinement and drain induced barrier lowering (DIBL) based on the calculation of charge and injection velocity is presented. The model used a single expression for current calculation in all regions to ensure the continuity of the model over all regions of operation. The model succeeded to simulate the ballistic double gate (DG) nano MOSFETs from linear to saturation regions of operation. The validation of the model was done by comparison with the standard NANOMOS numerical simulation. The error in the saturation region is about 6% and does not exceed 10% in the linear region.
Keywords :
MOSFET; nanoelectronics; quantum theory; semiconductor device models; ballistic double gate MOSFET; drain induced barrier lowering; injection velocity; nano MOSFET; quantum compact model; quantum confinement; quantum mechanical effect; Electrons; MOSFETs; Mathematical model; Mathematics; Numerical simulation; Physics; Quantum mechanics; Rough surfaces; Surface roughness; Voltage; DIBL; Double gate MOSFETs; ballistic current; quantum mechanical effects;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design & Technology of Integrated Systems in Nanoscal Era, 2009. DTIS '09. 4th International Conference on
Conference_Location :
Cairo
Print_ISBN :
978-1-4244-4320-8
Electronic_ISBN :
978-1-4244-4321-5
Type :
conf
DOI :
10.1109/DTIS.2009.4938043
Filename :
4938043
Link To Document :
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