DocumentCode
3421422
Title
Vertical capacitive SiBARs
Author
Pourkamali, Siavash ; Ho, Gavin K. ; Ayazi, Farrokh
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2005
fDate
30 Jan.-3 Feb. 2005
Firstpage
211
Lastpage
214
Abstract
This work introduces high frequency, vertical silicon bulk acoustic resonators (SiBAR). A combination of the new resonator structures with much larger transduction area and the HARPSS fabrication process is used to demonstrate high frequency capacitive resonators with significantly lower impedances compared to the previous capacitive resonators. Impedances as low as a few kilo-Ohms and quality factors in the range of 20,000 to 50,000 in the VHF range have been achieved for the first thickness mode of the fabricated resonators. Resonant frequencies as high as 983MHz are demonstrated for the third thickness modes of the capacitive SiBARs.
Keywords
Q-factor; UHF devices; acoustic microwave devices; acoustic resonators; bulk acoustic wave devices; resonators; HARPSS fabrication process; high frequency SiBARs; high frequency capacitive resonators; quality factors; resonant frequency; resonator structures; vertical capacitive SiBARs; vertical silicon bulk acoustic resonators; Acoustic waves; Fabrication; Film bulk acoustic resonators; Impedance; Q factor; Resonant frequency; Resonator filters; Silicon; Surface acoustic waves; Wireless communication;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
ISSN
1084-6999
Print_ISBN
0-7803-8732-5
Type
conf
DOI
10.1109/MEMSYS.2005.1453904
Filename
1453904
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