Title :
Multi-layered fabrication of microstructures and thin film transistors-application to polycrystalline silicon field emitters controlled by TFTs
Author :
Hashiguchi, Gen ; Mimura, Hidenori ; Fujita, Hiroyuki
Author_Institution :
Adv. Technol. Res. Lab., Nippon Steel Corp., Kanagawa, Japan
Abstract :
We have fabricated a new multi-layered structure of a polycrystalline silicon field emitter array (poly-Si FEA) on top of a thin film transistor (TFT) by successive application of micromachining, TFT fabrication, and wafer bonding and dissolving processes. The TFT not only controls the field emission but also stabilizes it. Since the TFT does not consume the space for the poly-Si FEA fabrication, the structure will be a good candidate for high quality flat panel displays. In this paper, we demonstrate fabrication of the multi-layered structure and show a successful emission control by the TFT
Keywords :
electron field emission; elemental semiconductors; micromechanical devices; silicon; thin film transistors; vacuum microelectronics; CVD; MEMS; Si; Si polycrystalline field emitters; TFT; dissolving; electrical characteristics; emission control; field emitter array; flat panel displays; micromachining; microstructures; multi-layered fabrication; polysilicon FEA fabrication; reactive ion etching; stabilisation; switching characteristics; thin film transistor; thin film transistors; wafer bonding; Circuits; Fabrication; Field emitter arrays; Glass; Micromachining; Microstructure; Optical arrays; Silicon compounds; Substrates; Thin film transistors;
Conference_Titel :
Micro Electro Mechanical Systems, 1996, MEMS '96, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE, The Ninth Annual International Workshop on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-2985-6
DOI :
10.1109/MEMSYS.1996.493828
