DocumentCode
3422500
Title
Anodically bonded silicon membranes for sealed and flush mounted microsensors
Author
Trautweiler, S.F. ; Paul, O. ; Stahl, J. ; Baltes, H.
Author_Institution
Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland
fYear
1996
fDate
11-15 Feb 1996
Firstpage
61
Lastpage
66
Abstract
This paper reports a novel fabrication process which improves the thermal isolation of silicon membrane structures and allows the resulting devices to be flush mounted in a wall keeping the electronically active side of the membrane protected from the medium to be measured. Silicon wafers are bonded anodically with their processed front to Pyrex glass substrates. After the silicon is etched down to about 15 μm the bonded wafers are diced. The separated devices are glued onto ceramic substrates and electrically connected by wire bonds. The bonding pads of the device are located on the membrane and the wires are applied through holes in the glass substrate. Only the rear of the membrane is exposed to the medium while the electronically active side and the electrical connections are sealed. Important thermal and mechanical properties are derived from finite element models and measurements. Finally, we demonstrate this new approach by the fabrication and characterization of membrane-based thermal flow sensors
Keywords
elemental semiconductors; membranes; microsensors; semiconductor technology; silicon; 15 mum; Pyrex glass substrates; Si; Si membranes; Si wafers; ceramic substrates; electrical connections; electronically active side; fabrication; finite element models; flush mounted microsensors; mechanical properties; sealed microsensors; thermal flow sensors; thermal isolation; thermal properties; Biomembranes; Ceramics; Etching; Fabrication; Glass; Mechanical factors; Protection; Silicon; Wafer bonding; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1996, MEMS '96, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE, The Ninth Annual International Workshop on
Conference_Location
San Diego, CA
Print_ISBN
0-7803-2985-6
Type
conf
DOI
10.1109/MEMSYS.1996.493830
Filename
493830
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