Title :
Fabrication of MEMS structure with nano-gap using photo-assisted electrochemical etching
Author :
Kim, Dae Hyun ; Kim, Hyeon Cheol ; Chun, Kukjin
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea
fDate :
30 Jan.-3 Feb. 2005
Abstract :
In this paper, MEMS comb structures with several tens of nanometer gap and ultra high aspect ratio more than 125:1 has been achieved using modified photo-assisted electro-chemical etching method. It is possible to control the gap of the comb structure from 50 nm to 1 μm by adjusting the intensity of the light source, which is unusually blue LED (light emitting diodes) in this experiment. By changing the bias and the composition of electrolyte that consists of H2O or DMF (dimethyl-formamide) based 5% HF (hydrofluoric acid) and 20% ethanol as a wetting agent, the characteristics of the etching were observed. Finally MEMS comb structure with uniform 200 nm gap and 25 μm depth was well defined.
Keywords :
etching; micromachining; microsensors; 25 micron; 50 to 1000 nm; H2O; HCON(CH3)2; HF; MEMS structure fabrication; comb structure; dimethyl-formamide; electrolyte; ethanol; hydro-fluodic acid; light emitting diodes; light source intensity; nanometer gap; photo-assisted electrochemical etching; ultra high aspect ratio; wetting agent; Fabrication; Hafnium; Light emitting diodes; Light sources; Lighting control; Microelectromechanical devices; Micromechanical devices; Nanostructures; Silicon; Wet etching;
Conference_Titel :
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
Print_ISBN :
0-7803-8732-5
DOI :
10.1109/MEMSYS.2005.1453986
