Title :
Characterization of a micromachined planar patch clamp for cellular electrophysiology
Author :
Matthews, B. ; Judy, J.W.
Author_Institution :
Dept. of Electr. Eng., Univ. of California, Los Angeles, CA, USA
Abstract :
We have fabricated planar patch-clamp substrates suitable for use in cellular electrophysiology. The substrates are a base component of a larger automated dose-response measurement system. Substrates with cell-patch-site apertures ranging from 0.5 μm to 11 μm were fabricated using standard MEMS techniques. The resistance of the cell-patch-site apertures and substrate capacitance were measured using impedance spectroscopy. The resistance of the cell-patch sites ranged from 0.2 MΩ to 47 MΩ for apertures ranging from 12 μm to 0.75 μm. The substrate capacitance was 17.2 pF per mm2 of fluid contact area for substrates with a 2-μm thick layer of silicon dioxide. It was found that the electrical properties of the substrates are acceptable for use in electrophysiological applications.
Keywords :
bioelectric phenomena; biological techniques; biomembrane transport; electrochemical impedance spectroscopy; microfluidics; micromachining; photolithography; substrates; 0.2 to 47 Mohm; 0.5 to 11 micron; MEMS techniques; automated dose-response measurement system; cell-patch-site apertures; cellular electrophysiology; cellular membrane conductance; equivalent-circuit model; impedance spectroscopy; ion channels; microfluidic manipulation; micromachined substrates; photolithography; planar patch-clamp substrates; two-mask process; Apertures; Biomembranes; Capacitance; Clamps; Electrical resistance measurement; Fabrication; Micromachining; Micromechanical devices; Optical microscopy; Seals;
Conference_Titel :
Neural Engineering, 2003. Conference Proceedings. First International IEEE EMBS Conference on
Print_ISBN :
0-7803-7579-3
DOI :
10.1109/CNE.2003.1196912
