DocumentCode
3424544
Title
Monolithic MCP using photosensitive glass
Author
Sakamoto, T. ; Takahashi, K. ; Takeuchi, S.
Author_Institution
Dept. of Electron., Saitama Univ., Urawa, Japan
fYear
1995
fDate
4-6 Dec 1995
Firstpage
175
Lastpage
178
Abstract
Micro Channel Plates (MCPs) using photosensitive glass and PbO films for secondary electron multiplication have been developed. The diameter of the microchannels and the channel pitch of the fabricated MCP are 70 μm and 81 μm, respectively. The average value of the aspect ratio of the microchannels is about 11. PbO films deposited on the internal surface of microchannels were produced by the sol-gel method. The electron gain of the MCP is about 27 at the dynode voltage of 400 V
Keywords
image intensifiers; lead compounds; microchannel plates; optical glass; photomultipliers; secondary electron emission; sol-gel processing; 400 V; 70 micron; 81 micron; PbOSiO2; aspect ratio; channel pitch; dynode voltage; electron gain; micro channel plates; photosensitive glass; secondary electron multiplication; sol-gel method; Colloidal crystals; Crystallization; Electrons; Etching; Glass; Hafnium; Integrated circuit technology; Microchannel; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Manufacturing Technology Symposium, 1995, Proceedings of 1995 Japan International, 18th IEEE/CPMT International
Conference_Location
Omiya
Print_ISBN
0-7803-3622-4
Type
conf
DOI
10.1109/IEMT.1995.541021
Filename
541021
Link To Document