DocumentCode
3425486
Title
Fully integrated nanoresonator system with attogram/Hz mass resolution
Author
Worsen, E. ; Abadal, G. ; Nilsson, S.G. ; Verd, J. ; Sandberg, R. ; Svendsen, J.T. ; Teva, J. ; Peréz-Murano, F. ; Esteve, J. ; Figueras, E. ; Campabadal, F. ; Montelius, L. ; Barniol, N. ; Boisen, A.
Author_Institution
Dept. of Micro & Nanotechnol., Tech. Univ. of Denmark, Denmark
fYear
2005
fDate
30 Jan.-3 Feb. 2005
Firstpage
867
Lastpage
870
Abstract
Nanoresonator systems have been fully integrated on pre-processed complementary metal oxide semiconductor (CMOS) chips. The systems have been used for high sensitivity mass sensing in air and vacuum. The resonator system, which consists of a cantilever and structures for electrostatic actuation and capacitive read-out, has been defined by low energy electron beam lithography (EBL) combined with direct write laser lithography (DWL) on top of a radiation sensitive CMOS layer. The fabrication of the nanoresonator system has been conducted as a post-process step. CMOS integration radically decreases the parasitic capacitance, enabling detection and amplification of the resonance signal directly on the chip. Fabricated resonator systems have been designed to have resonance frequencies in the range of 1-1.6 MHz. A mass resolution of 3 ag/Hz has been determined in air by placing a single glycerine drop at the apex of a cantilever and subsequently measuring a frequency shift of 14.8 kHz. The frequency shift corresponds to an added mass of 50 fg, which is close to the estimated weight of 41 fg for the glycerine drop.
Keywords
CMOS integrated circuits; electron beam lithography; micromechanical resonators; nanotechnology; 1 to 1.6 mHz; 14.8 kHz; capacitive read-out; complementary metal oxide semiconductor chips; direct write laser lithography; electrostatic actuation; higb sensitivity mass sensing; low energy electron beam lithography; mass resolution; nanoresonator system; radiation sensitive CMOS; Electron beams; Electrostatic actuators; Energy resolution; Frequency estimation; Lithography; Optical device fabrication; Parasitic capacitance; Resonance; Semiconductor lasers; Vacuum systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
ISSN
1084-6999
Print_ISBN
0-7803-8732-5
Type
conf
DOI
10.1109/MEMSYS.2005.1454067
Filename
1454067
Link To Document