DocumentCode
3425515
Title
Micro proximity electron source for nanoprocessing in atmosphere
Author
Cho, Wonie ; Ono, Takahito ; Minh, Phan Ngoc ; Esashi, Masayoshi
Author_Institution
Graduate Sch. of Eng., Tohoku Univ., Sendai, Japan
fYear
2005
fDate
30 Jan.-3 Feb. 2005
Firstpage
875
Lastpage
878
Abstract
We have designed and fabricated a miniature proximity electron source, which can be used in atmosphere for future high density data storage or electron beam direct lithography. Carbon nanocoils (CNCs) grown on silicon are adopted as electron emitters because of their excellent field emission properties. Electrons are transmitted from a vacuum-sealed cavity to atmosphere through a thin film called as an electron window. As the membrane of the electron window, an ultrathin silicon film is chosen. The submicron diameter of the window will make narrow exuded electron distribution. We propose the concept and design of the device and report on the result of fabrication and measurements of the emission characteristics of CNCs.
Keywords
electron field emission; electron sources; nanotechnology; silicon; thin films; carbon nanocoils; electron beam direct lithography; electron emitters; electron window; high density data storage; microproximity electron source; miniature proximity electron source; nanoprocessing; thin film; ultrathin silicon film; vacuum-sealed cavity; Atmosphere; Biomembranes; Carbon dioxide; Electron beams; Electron guns; Electron sources; Lithography; Memory; Silicon; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
ISSN
1084-6999
Print_ISBN
0-7803-8732-5
Type
conf
DOI
10.1109/MEMSYS.2005.1454069
Filename
1454069
Link To Document