• DocumentCode
    3425515
  • Title

    Micro proximity electron source for nanoprocessing in atmosphere

  • Author

    Cho, Wonie ; Ono, Takahito ; Minh, Phan Ngoc ; Esashi, Masayoshi

  • Author_Institution
    Graduate Sch. of Eng., Tohoku Univ., Sendai, Japan
  • fYear
    2005
  • fDate
    30 Jan.-3 Feb. 2005
  • Firstpage
    875
  • Lastpage
    878
  • Abstract
    We have designed and fabricated a miniature proximity electron source, which can be used in atmosphere for future high density data storage or electron beam direct lithography. Carbon nanocoils (CNCs) grown on silicon are adopted as electron emitters because of their excellent field emission properties. Electrons are transmitted from a vacuum-sealed cavity to atmosphere through a thin film called as an electron window. As the membrane of the electron window, an ultrathin silicon film is chosen. The submicron diameter of the window will make narrow exuded electron distribution. We propose the concept and design of the device and report on the result of fabrication and measurements of the emission characteristics of CNCs.
  • Keywords
    electron field emission; electron sources; nanotechnology; silicon; thin films; carbon nanocoils; electron beam direct lithography; electron emitters; electron window; high density data storage; microproximity electron source; miniature proximity electron source; nanoprocessing; thin film; ultrathin silicon film; vacuum-sealed cavity; Atmosphere; Biomembranes; Carbon dioxide; Electron beams; Electron guns; Electron sources; Lithography; Memory; Silicon; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-8732-5
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2005.1454069
  • Filename
    1454069