DocumentCode
3427257
Title
Microriveting-a new wafer joining method
Author
Shivkumar, Bharat ; Kim, Chang-Jin
Author_Institution
Dept. of Mech. & Aerosp. Eng., California Univ., Los Angeles, CA, USA
fYear
1997
fDate
26-30 Jan 1997
Firstpage
197
Lastpage
202
Abstract
Microriveting, a new technique to join wafers, is presented as an alternative to wafer bonding. Actual microrivets are fabricated to provide proof-of-concept structures and have been tested to confirm the feasibility of the idea for MEMS packaging. The microrivets of this paper are developed by nickel electroplating. Advantages of this technique include the joining process performed at room temperature and low voltage and relaxed requirements for surface preparation. Wafers of different sizes have been joined together by riveting and did not separate at large (macro) forces applied by rough handling and even by wafer sawing. Failure mechanisms of these rivets are investigated, and measurements are carried out to determine the joining strength under shear and tension. Results show that microriveting is a feasible and economical joining technique to package microdevices
Keywords
electroplating; failure analysis; fracture toughness testing; integrated circuit packaging; mechanical testing; micromachining; micromechanical devices; shear strength; MEMS packaging; Ni electroplating; failure mechanisms; feasibility; joining process; joining strength; low voltage; microriveting; room temperature; shear; surface preparation; tension; wafer sawing; Joining processes; Low voltage; Micromechanical devices; Nickel; Packaging; Rough surfaces; Surface roughness; Temperature; Testing; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1997. MEMS '97, Proceedings, IEEE., Tenth Annual International Workshop on
Conference_Location
Nagoya
ISSN
1084-6999
Print_ISBN
0-7803-3744-1
Type
conf
DOI
10.1109/MEMSYS.1997.581803
Filename
581803
Link To Document