Title :
Angular micropositioner for disk drives
Author :
Horsley, David A. ; Singh, Angad ; Pisano, Albert P. ; Horowitz, Roberto
Author_Institution :
Sensor & Actuator Center, California Univ., Berkeley, CA, USA
Abstract :
Rotary electrostatic microactuators suitable for use in a two-stage servo system for magnetic disk drives have been fabricated using the HexSil process. A 2.6 mm diameter device is shown to be capable of producing 0.17 mN-mm of output torque, corresponding to a predicted actuation bandwidth of 1.6 kHz. The structures are formed from LPCVD polysilicon deposited into deep trenches etched into a silicon mold wafer. Upon release, these structures are transferred to a target wafer using a solder bond. The solder bonding process will provide easy integration of mechanical structures with integrated circuits, allowing separate optimization of the circuit and structure fabrication processes. An advantage of HexSil is that once the mold wafer has undergone the initial plasma etching, it may be re-used for subsequent polysilicon depositions, amortizing the cost of the deep trench etching over many structural runs and thereby significantly reducing the cost of finished actuators. Further, 100 μm high structures may be made from a 3 μm deposition of polysilicon, increasing overall fabrication speed
Keywords :
chemical vapour deposition; electrostatic devices; elemental semiconductors; hard discs; microactuators; semiconductor growth; silicon; sputter etching; wafer bonding; 1.6 kHz; 100 micron; 2.6 mm; HexSil process; LPCVD; Si; actuation bandwidth; angular micropositioner; deep trenches; disk drives; fabrication speed; mechanical structures; mold wafer; output torque; plasma etching; polysilicon; rotary electrostatic microactuators; solder bonding process; two-stage servo system; Bandwidth; Costs; Disk drives; Electrostatics; Etching; Fabrication; Magnetic separation; Microactuators; Servomechanisms; Torque;
Conference_Titel :
Micro Electro Mechanical Systems, 1997. MEMS '97, Proceedings, IEEE., Tenth Annual International Workshop on
Conference_Location :
Nagoya
Print_ISBN :
0-7803-3744-1
DOI :
10.1109/MEMSYS.1997.581890