The tool efficiency monitoring system creation of furnace area in semiconductor manufacturing

This paper describes a framework of efficiency monitoring system of furnace area in semiconductor manufacturing factory. One of the primary objectives was to review the efficiency of operator. In particular, the system focused on finding the effective efficiency index. Secondary objectives were to provide wafer per hour (WPH) data, especially for the newly developed technology, and to prepare a prototype for the out of control abnormal procedure (OCAP) warming system. With this approach, we establish an effective review system for operator; therefore, improve 10 to 15% capacity of our key furnace tubes. Now a simple warming system of operator efficiency is ready and starts to install to the other production area.