DocumentCode :
3431862
Title :
Study of the thermal drift of the offset voltage of silicon pressure sensor
Author :
Boukabache, A. ; Blasquez, G. ; Pons, P. ; Dibi, Z.
Author_Institution :
Inst. d´´Electron., Constantine Univ., Algeria
Volume :
2
fYear :
1999
fDate :
5-8 Sep 1999
Firstpage :
1051
Abstract :
Pressure sensors produced using microelectronic techniques, in particular those based on the piezoresistive effect of silicon, present a high gauge factor. However, the electrical behaviour of the sensor is highly dependent on the temperature gradient. Thus, they have also some limitations such as the offset voltage and its thermal drift. In this study, we present a theoretical approach and experiments to analyse the electrical response of a pressure sensor fabricated using monocrystalline silicon. This analysis is focused on the thermal behaviour of the offset voltage and its origins. It allows us to differentiate between the two kinds of the piezoresistors included in the Wheatstone bridge and to link their thermal coefficients to that of the thermal drift of the offset voltage
Keywords :
bridge instruments; elemental semiconductors; piezoelectric transducers; piezoresistive devices; pressure sensors; silicon; Si; Wheatstone bridge; electrical behaviour; electrical response; offset voltage; piezoresistive effect; pressure sensor; thermal coefficient; thermal drift; Biomembranes; Bridge circuits; Microelectronics; Passive optical networks; Piezoresistive devices; Sensor phenomena and characterization; Silicon; Temperature sensors; Thermal sensors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics, Circuits and Systems, 1999. Proceedings of ICECS '99. The 6th IEEE International Conference on
Conference_Location :
Pafos
Print_ISBN :
0-7803-5682-9
Type :
conf
DOI :
10.1109/ICECS.1999.813414
Filename :
813414
Link To Document :
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