DocumentCode :
3431913
Title :
Standard free determination of trace metals in semiconductor chemicals by ICP-MS
Author :
Lin, Y.P. ; Liu, S.H. ; Lai, W.S. ; Chen, S.L.
Author_Institution :
Taiwan Semicond. Manuf. Co., Ltd., Hsin-Chu, Taiwan
fYear :
2002
fDate :
10-11 Dec. 2002
Firstpage :
172
Lastpage :
175
Abstract :
This paper interprets quadrupole ICP-MS with PFA nebulizer for the spike recovery test of Na (sodium), Al (aluminum) and Cu (copper) in HF (hydrofluoric acid), BOE (buffer oxide etchant), APM (ammonia peroxide mixture) and HPM (hydrogen chloride peroxide mixture) by the direct sample introduction and analysis without matrix elimination procedure. The spike recoveries of Na, Al and Cu were all located in the range of 85%-115% with a 0.4 ppb spiked solution in various chemicals under the hot plasma mode. When using the semi-quantitative equation in the determination of unknown elements by standard reference to Na, Al would have good consistency between its measured value and calculated value.
Keywords :
aluminium; copper; mass spectroscopic chemical analysis; semiconductor device manufacture; sodium; Al; Cu; ICP; Na; ammonia peroxide mixture; buffer oxide etchant; hydrogen chloride peroxide mixture; matrix elimination; plasma mode; quadrupole inductively coupled plasma; semiconductor chemicals; semiquantitative equation; spike recovery test; trace metals standard free determination; Aluminum; Chemicals; Copper; Etching; Hafnium; Hydrogen; Plasma applications; Plasma chemistry; Plasma measurements; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Technology Workshop, 2002
Print_ISBN :
0-7803-7604-8
Type :
conf
DOI :
10.1109/SMTW.2002.1197402
Filename :
1197402
Link To Document :
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