Title :
Multicriteria dynamic dispatching schema for balancing the load on lithographic tools in wafer fabrication
Author :
Pan, Chen-Chung ; Lo, Hsi-Lo ; Chang, Chuan-Chung
Author_Institution :
Winbond Electron. Corp., Hsinchu, Taiwan
Abstract :
As the requirement of critical dimension and overlay control are getting tighter and tighter, one way to meet this requirement is to dedicate identical scanner for running several critical layers. This constraint of scanner dedication can reduce scanner´s utilization, hence reduce fab productivity. The idea proposed in this article is to keep the loading balance among key scanners for maximizing their utilization.
Keywords :
VLSI; integrated circuit manufacture; lithography; production control; productivity; resource allocation; wafer-scale integration; VLSI processing; critical dimension; dynamic dispatching; lithographic tools; loading balance; productivity; scanner dedication; scanner utilization; wafer fabrication; Current measurement; Dispatching; Electronics industry; Fabrication; Industrial control; Industrial electronics; Job shop scheduling; Productivity; Textile industry; Time measurement;
Conference_Titel :
Semiconductor Manufacturing Technology Workshop, 2002
Print_ISBN :
0-7803-7604-8
DOI :
10.1109/SMTW.2002.1197405
