A study on resource management of design change requirement for new wafer fab construction

Author

Lo, Mei Chen ; Wu, Hsin Chen ; Lai, C.M. ; Chiang, S.H.

Author_Institution

Taiwan Semicond. Manuf. Co., Hsin-Chu, Taiwan

fYear

2002

fDate

10-11 Dec. 2002

Firstpage

238

Lastpage

240

Abstract

Though design change requirement (DCR) is part of life in a new fab construction given the difficulty for integrating all construction related vendors prior to fab construction and the fast change in technologies. In order to contain the quantity of DCR without scarifying the specification requirements of any systems during a new fab construction is getting more attention from fab management team. The objective of this article is to use the result of recent surveys in 8 inch and 12 inch wafer fab construction cases with statistically modeling to find the optimization of the DCR level for a fab construction project. This study looks into the causes of DCR and then provide possible solutions to minimize the occurrence of the DCR for the future fab construction project.

Keywords

integrated circuit manufacture; management of change; optimisation; resource allocation; wafer-scale integration; 12 inch; 8 inch; design change requirement; fab management team; optimization; resource management; semiconductor device manufacture; vendors; wafer fab construction; Buildings; Companies; Costs; Financial management; Process planning; Resource management; Safety; Semiconductor device manufacture; Semiconductor device modeling; Technology management;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Technology Workshop, 2002

Print_ISBN

0-7803-7604-8

Type

conf

DOI

10.1109/SMTW.2002.1197430

Filename

1197430