DocumentCode
3432571
Title
Complete monitoring and matching strategy for multiple CD SEMs in advanced fab
Author
Lee, Pey-Yuan ; Lo, Chi-Shen ; Yi-Hung Chen ; Teng, Thomas ; Fu, Steven ; Chu, Mico ; Yee, Jason
Author_Institution
Quality & Reliability Dept., TSMC, Tainan, Taiwan
fYear
2002
fDate
10-11 Dec. 2002
Firstpage
256
Lastpage
259
Abstract
In a multiple CD SEM fab, the CD matching and tool stability performance of CD SEM become more and more crucial for new technology generation. In this article, we first address the method to match tools, and also introduce the current monitoring system of linewidth for multiple tools. Next, a new design monitor wafer is introduced. This new design successfully reduces the carryover and it could be a potential standard to monitor the absolute linewidth and control the stability of CD SEM.
Keywords
precision engineering; process monitoring; scanning electron microscopy; semiconductor device manufacture; tools; CD SEM fab; carryover; critical dimension matching; current monitoring system; design monitor wafer; matching strategy; monitor absolute linewidth; tool stability; Calibration; Condition monitoring; Degradation; Error correction; Focusing; Image quality; Metrology; Pollution measurement; Quality control; Stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Technology Workshop, 2002
Print_ISBN
0-7803-7604-8
Type
conf
DOI
10.1109/SMTW.2002.1197441
Filename
1197441
Link To Document