Total solution of line CD measurement quality control and application of statistical methods for CDSEM line CD measurement stability

Author

Lee, Pey-Yuan ; Lo, Chi-Shen ; Chen, Yi-Hung ; Yang, Hong-Ji ; Teng, Thomas ; Fu, Steven ; Chu, Mico ; Yee, Jason

Author_Institution

Quality & Reliability Dept., TSMC, Tainan, Taiwan

fYear

2002

fDate

10-11 Dec. 2002

Firstpage

260

Lastpage

263

Abstract

The line CD measurement stability has to be evaluated in addition to pitch CD in sub-130 nm node. Regression SPC has been conducted for evaluating CDSEM with the linear growth of the control wafer, that is constructed to minimize the well-know carry-over effect. Also, the P-value is applied in model diagnostic, Exponentially Weighted Moving Average (EWMA) control chart is employed to detect the small shift of measurement process. Eventually, to definitely quantify the CDSEM line width measurement variation and also to indicate how measurement variation contribute the process variation(Cp) by means of Regression SPC.

Keywords

control charts; monitoring; moving average processes; quality control; statistical analysis; carry over effect; control chart; control wafer; exponentially weighted moving average; line CD measurement quality control; process variation; statistical methods; Calibration; Condition monitoring; Control charts; Linear regression; Pollution measurement; Process control; Quality control; Semiconductor device modeling; Stability; Statistical analysis;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Technology Workshop, 2002

Print_ISBN

0-7803-7604-8

Type

conf

DOI

10.1109/SMTW.2002.1197442

Filename

1197442