DocumentCode :
3433382
Title :
Comparative Study on SRAMs for Suppressing Both Oxide-Tunneling Leakage and Subthreshold Leakage in Sub-70-nm Leakage Dominant VLSIs
Author :
Lee, Duk-Hyung ; Kwak, Dong-Kone ; Min, Kyeong-Sik
Author_Institution :
Sch. of Electr. Eng., Kookmin Univ., Seoul
fYear :
2007
fDate :
6-10 Jan. 2007
Firstpage :
632
Lastpage :
637
Abstract :
In this paper, we compare 4 SRAM circuits. They are the conventional ´SRAM1´, ´SRAM2´ with power switches on VSs line, ´SRAM3´ with switches on VDD line, and ´SRAM4´ with switches on VDD and Vss lines, respectively. Among 4 SRAMs, SRAM2 shows the smallest amount of leakage, because its subthreshold leakage is most suppressed by its BODY and DIBL effects. To reduce the oxide-tunneling leakage more, ´SRAM5´ with lowering of its precharge voltage is considered in this paper. Compared with SRAM2 without lowering of the precharge voltage, the amounts of leakage of SRAM5 are suppressed by 27.2%, 16.8%, and 6.3%, respectively, at -25degC, 25degC, and 100degC
Keywords :
SRAM chips; leakage currents; power semiconductor switches; -25 C; 100 C; 25 C; BODY effects; DIBL effects; SRAM circuits; VLSI; oxide-tunneling leakage; power switches; subthreshold leakage; Leakage current; Logic circuits; MOSFET circuits; Predictive models; Random access memory; Subthreshold current; Switches; Variable structure systems; Very large scale integration; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Design, 2007. Held jointly with 6th International Conference on Embedded Systems., 20th International Conference on
Conference_Location :
Bangalore
ISSN :
1063-9667
Print_ISBN :
0-7695-2762-0
Type :
conf
DOI :
10.1109/VLSID.2007.49
Filename :
4092113
Link To Document :
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