DocumentCode :
3434050
Title :
High-resolution interferometric metrology of wafers
Author :
Farrant, David ; Arkwright, John ; Netterfield, Roger
Author_Institution :
CSIRO Ind. Phys., Lindfield, NSW
fYear :
2006
fDate :
10-13 July 2006
Firstpage :
151
Lastpage :
151
Abstract :
The resolution of a scanning technique for interferometrically measuring transparent wafers is analysed and it is shown that sub-nanometre resolution can be readily achieved in the measurement of optical thickness variations over large apertures.
Keywords :
interferometry; optical materials; optical variables measurement; interferometric metrology; optical thickness variation measurement; subnanometre resolution; transparent wafers; Australia; Fabry-Perot; Metrology; Optical interferometry; Optical refraction; Optical surface waves; Optical variables control; Reflectivity; Surface waves; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fibre Technology/Australian Optical Society, 2006. ACOFT/AOS 2006. Australian Conference on
Conference_Location :
Melbourne, VIC
Print_ISBN :
978-0-9775657-1-9
Electronic_ISBN :
978-0-9775657-1-9
Type :
conf
DOI :
10.1109/ACOFT.2006.4519300
Filename :
4519300
Link To Document :
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