DocumentCode :
3434202
Title :
The GE high density overlay MCM interconnect method solves high power needs of GaAs system design
Author :
Gdula, Michael ; Yerman, Alexander ; Krishnamurthy, Vikram ; Fillion, Raymond
Author_Institution :
GE, Schenectady, NY, USA
fYear :
1993
fDate :
1993
Firstpage :
339
Lastpage :
345
Abstract :
As electronic systems signals and clock rates exceed 100 MHz, designers must consider the use of emerging high performance digital GaAs chip technology. Because GaAs parts do not yield at the high rates of more mature silicon technology devices, it is presently infeasible to build monolithic wafer scale integration (WSI) with GaAs technology. A hybrid wafer scale integration (HWSI) approach has been developed to overcome the limits of monolithic approaches, including the ability to provide for multichip module (MCM) process optimizations serving low IR loss requirements for power delivery, and use of overlay interconnect, first placing the chip into a structure for the most advantageous thermal management.
Keywords :
VLSI; digital integrated circuits; hybrid integrated circuits; integrated circuit technology; multichip modules; thermal analysis; 100 MHz; MCM interconnect method; digital GaAs chip technology; high density overlay; hybrid WSI; low IR loss requirements; multichip module; process optimizations; thermal management; wafer scale integration; Dielectric substrates; Dielectric thin films; Gallium arsenide; Integrated circuit interconnections; Power system interconnection; Semiconductor device modeling; Silicon; Switches; Thermal conductivity; Thermal management;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wafer Scale Integration, 1993. Proceedings., Fifth Annual IEEE International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-0867-0
Type :
conf
DOI :
10.1109/ICWSI.1993.255244
Filename :
255244
Link To Document :
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