• DocumentCode
    3434468
  • Title

    Reliability of low current filamentary HfO2 RRAM discussed in the framework of the hourglass SET/RESET model

  • Author

    Degraeve, Robin ; Fantini, Andrea ; Chen, Y.Y. ; Clima, S. ; Govoreanu, B. ; Goux, L. ; Wouters, D.J. ; Roussel, Philippe ; Kar, Gouri Sankar ; Pourtois, G. ; Cosemans, S. ; Groeseneken, Guido ; Jurczak, Malgorzata ; Altimime, L.

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    2012
  • fDate
    14-18 Oct. 2012
  • Firstpage
    3
  • Lastpage
    7
  • Abstract
    We review our recent work on modeling of low current filamentary switching in amorphous HfO2 RRAM. The conduction is controlled by the width of the constriction, determining the electron transmission. The set and reset processes are modeled as a dynamic flow between two oxygen vacancy reservoirs connected by a narrow constriction. Reset is described as a dynamic balance between an upward and downward vacancy flow, while the set process is modeled as an unbalanced filament growth bounded by the external compliance. In the framework of this model, we discuss the intrinsic instabilities of narrow filamentary conduction that give rise to a series of reliability issue such as disturb and endurance. We explore some possible routes for improving the reliability.
  • Keywords
    hafnium compounds; random-access storage; semiconductor device reliability; HfO2; downward vacancy flow; dynamic balance; electron transmission; hourglass SET-RESET model; low current filamentary RRAM reliability; low current filamentary switching; oxygen vacancy reservoirs; Hafnium compounds; Reliability; Reservoirs; Resistance; Tin; Transient analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
  • Conference_Location
    South Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4673-2749-7
  • Type

    conf

  • DOI
    10.1109/IIRW.2012.6468904
  • Filename
    6468904