DocumentCode :
3434468
Title :
Reliability of low current filamentary HfO2 RRAM discussed in the framework of the hourglass SET/RESET model
Author :
Degraeve, Robin ; Fantini, Andrea ; Chen, Y.Y. ; Clima, S. ; Govoreanu, B. ; Goux, L. ; Wouters, D.J. ; Roussel, Philippe ; Kar, Gouri Sankar ; Pourtois, G. ; Cosemans, S. ; Groeseneken, Guido ; Jurczak, Malgorzata ; Altimime, L.
Author_Institution :
IMEC, Leuven, Belgium
fYear :
2012
fDate :
14-18 Oct. 2012
Firstpage :
3
Lastpage :
7
Abstract :
We review our recent work on modeling of low current filamentary switching in amorphous HfO2 RRAM. The conduction is controlled by the width of the constriction, determining the electron transmission. The set and reset processes are modeled as a dynamic flow between two oxygen vacancy reservoirs connected by a narrow constriction. Reset is described as a dynamic balance between an upward and downward vacancy flow, while the set process is modeled as an unbalanced filament growth bounded by the external compliance. In the framework of this model, we discuss the intrinsic instabilities of narrow filamentary conduction that give rise to a series of reliability issue such as disturb and endurance. We explore some possible routes for improving the reliability.
Keywords :
hafnium compounds; random-access storage; semiconductor device reliability; HfO2; downward vacancy flow; dynamic balance; electron transmission; hourglass SET-RESET model; low current filamentary RRAM reliability; low current filamentary switching; oxygen vacancy reservoirs; Hafnium compounds; Reliability; Reservoirs; Resistance; Tin; Transient analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4673-2749-7
Type :
conf
DOI :
10.1109/IIRW.2012.6468904
Filename :
6468904
Link To Document :
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