DocumentCode
3434468
Title
Reliability of low current filamentary HfO2 RRAM discussed in the framework of the hourglass SET/RESET model
Author
Degraeve, Robin ; Fantini, Andrea ; Chen, Y.Y. ; Clima, S. ; Govoreanu, B. ; Goux, L. ; Wouters, D.J. ; Roussel, Philippe ; Kar, Gouri Sankar ; Pourtois, G. ; Cosemans, S. ; Groeseneken, Guido ; Jurczak, Malgorzata ; Altimime, L.
Author_Institution
IMEC, Leuven, Belgium
fYear
2012
fDate
14-18 Oct. 2012
Firstpage
3
Lastpage
7
Abstract
We review our recent work on modeling of low current filamentary switching in amorphous HfO2 RRAM. The conduction is controlled by the width of the constriction, determining the electron transmission. The set and reset processes are modeled as a dynamic flow between two oxygen vacancy reservoirs connected by a narrow constriction. Reset is described as a dynamic balance between an upward and downward vacancy flow, while the set process is modeled as an unbalanced filament growth bounded by the external compliance. In the framework of this model, we discuss the intrinsic instabilities of narrow filamentary conduction that give rise to a series of reliability issue such as disturb and endurance. We explore some possible routes for improving the reliability.
Keywords
hafnium compounds; random-access storage; semiconductor device reliability; HfO2; downward vacancy flow; dynamic balance; electron transmission; hourglass SET-RESET model; low current filamentary RRAM reliability; low current filamentary switching; oxygen vacancy reservoirs; Hafnium compounds; Reliability; Reservoirs; Resistance; Tin; Transient analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4673-2749-7
Type
conf
DOI
10.1109/IIRW.2012.6468904
Filename
6468904
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