• DocumentCode
    3435050
  • Title

    Persistent photoconductivity in SIMOX films

  • Author

    Mayo, Santos ; Lowney, Jeremiah ; Roitman, Peter ; Novotny, Donald

  • Author_Institution
    Nat. Inst. of Standards & Technol., Gaithersburg, MD, USA
  • fYear
    1990
  • fDate
    2-4 Oct 1990
  • Firstpage
    156
  • Lastpage
    157
  • Abstract
    Photoinduced transient spectroscopy (PITS) was used to measure the persistent photoconductive (PPC) response in film resistors fabricated on two different commercial n-type SIMOX (separation by implantation of oxygen) wafers. A broadband, single-shot, flashlamp-pumped dye-laser pulse was used to photoexcite interband electrons in the film, and the decay of the induced excess carrier population was measured at temperatures in the 60-220 K range. The post-illumination conductivity transients observed show PPC signals exhibiting a nonexponential character. They were recorded for periods of time up to 30 s at constant temperature. Presented are the excess conductivity in SIMOX film annealed in nitrogen at 1300°C for 6 h and the hole-trap volume density at the conductive-film-buried-silicon interface
  • Keywords
    elemental semiconductors; photoconductivity; semiconductor-insulator boundaries; silicon; 1300 degC; 60 to 220 K; PPC signals; SIMOX films; Si-SiO2; annealed; excess conductivity; film resistors; hole-trap volume density; induced excess carrier population; interband electrons; n-type; persistent photoconductivity; photoinduced transient spectroscopy; post-illumination conductivity transients; Annealing; Conductive films; Conductivity; Electrons; Photoconductivity; Pulse measurements; Resistors; Spectroscopy; Temperature distribution; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOS/SOI Technology Conference, 1990., 1990 IEEE
  • Conference_Location
    Key West, FL
  • Print_ISBN
    0-87942-573-3
  • Type

    conf

  • DOI
    10.1109/SOSSOI.1990.145759
  • Filename
    145759