Title :
Vertical 1.3 μm optical modulator in silicon-on-insulator
Author :
Xiao, X. ; Sturm, J.C. ; Schwartz, P.V. ; Goel, K.K.
Author_Institution :
Dept. of Electr. Eng., Princeton Univ., NJ, USA
Abstract :
Reported is a new optical intensity modulator at 1.3 μm which utilizes a Fabry-Perot resonant cavity implemented by silicon-on-insulator technology to achieve a high modulation depth. A p-i-n diode modulator is placed outside the cavity. The 1.3 μm light comes in from the top, bounces back-and-forth inside the Fabry-Perot cavity, and is partially reflected back and partially transmitted through. At resonance, the reflectance is minimized. Forward biasing the p-i-n diode modulates the phase of the laser light inside the cavity and shifts the resonance of the cavity to convert the phase modulation to intensity modulation. Device fabrication and testing are outlined
Keywords :
integrated optoelectronics; optical modulation; optical resonators; p-i-n diodes; phase modulation; photodiodes; semiconductor-insulator boundaries; 1.3 micron; Fabry-Perot resonant cavity; SIMOX wafer; SOI; Si-SiO2; optical intensity modulator; p-i-n diode modulator; vertical optical modulator; Fabry-Perot; Intensity modulation; Optical device fabrication; Optical modulation; P-i-n diodes; Phase modulation; Reflectivity; Resonance; Silicon on insulator technology; Testing;
Conference_Titel :
SOS/SOI Technology Conference, 1990., 1990 IEEE
Conference_Location :
Key West, FL
Print_ISBN :
0-87942-573-3
DOI :
10.1109/SOSSOI.1990.145767