DocumentCode :
3435545
Title :
Geometrical impact on RF performances of broadband ESD self protected transmission line in advanced CMOS technologies
Author :
Tekfouy Lim ; Jimenez, Joaquin ; Benech, Ph ; Fournier, Jacques ; Heitz, B. ; Galy, Ph
Author_Institution :
STMicroelectron., Crolles, France
fYear :
2012
fDate :
14-18 Oct. 2012
Firstpage :
183
Lastpage :
186
Abstract :
Advanced CMOS technologies provide an easy way to realize radio-frequency integrated circuits (RFICs). However, transistor gates are getting smaller and electrostatic discharge (ESD) issues become more significant. Unfortunately, parasitic capacitance of the ESD protection limits the operating bandwidth of the RFICs. The size (i.e. die area) of ESD protection is also of concern in RFICs. This paper presents results of transmission line with ESD protection devices able to be implemented in an I/O pad in advanced CMOS technologies.
Keywords :
CMOS integrated circuits; electrostatic discharge; radiofrequency integrated circuits; transmission lines; ESD protection devices; I/O pad; RF performances; RFIC; advanced CMOS technology; broadband ESD self-protected transmission line; electrostatic discharge; radiofrequency integrated circuits; transistor gates; Broadband communication; CMOS integrated circuits; CMOS technology; Electrostatic discharges; Impedance; Radio frequency; Transmission line measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4673-2749-7
Type :
conf
DOI :
10.1109/IIRW.2012.6468951
Filename :
6468951
Link To Document :
بازگشت