Title :
On the accuracy of Elmore-based Delay Models
Author :
Dos Santos, Glauco B V ; Reimann, Tiago J. ; de O.Johann, M. ; da L.Reis, R.A.
Author_Institution :
Programa de Pos Grad. em Microeletronica - PGMICRO, UFRGS, Porto Alegre, Brazil
Abstract :
We evaluate Elmore-based Interconnect Delay Models under nanoscale technology parameters. Due to a large delay overestimation Elmore delay provides at specific nodes, some attempts to provide more accurate models have been made. However, without reasonable parameters corresponding to actual cmos processes generations, the evaluation of the derived models is potentially dubitable. With technology parameters corresponding to the smaller feature sizes available, we evaluate the ac-curacy of Elmore-based delay models in nowadays VLSI scenarios. Besides an overview of the delay models behavior along technological scaling, we measure the different accuracy for intermediate/local and long/global interconnects.
Keywords :
integrated circuit interconnections; nanotechnology; CMOS processes generations; Elmore-based interconnect delay models; delay overestimation; nanoscale technology; technological scaling; Analytical models; CMOS process; CMOS technology; Capacitance; Delay effects; Delay estimation; Physics computing; Routing; Semiconductor device modeling; Very large scale integration; Delay Models; Elmore Delay; Interconnect Modeling; Nanoscale technologies; component;
Conference_Titel :
Electronics, Circuits, and Systems, 2009. ICECS 2009. 16th IEEE International Conference on
Conference_Location :
Yasmine Hammamet
Print_ISBN :
978-1-4244-5090-9
Electronic_ISBN :
978-1-4244-5091-6
DOI :
10.1109/ICECS.2009.5410894