DocumentCode :
3437218
Title :
The effect of GaP in Al-free, GaAs-based resonant tunnelling diodes
Author :
Wernersson, Lars-Erik ; Gustafson, B. ; Gustafsson, A. ; Borgstrom, M. ; Pietzonka, I. ; Pistol, M.-E. ; Sass, T. ; Seifert, W.
Author_Institution :
Dept. of Solid State Phys., Lund Univ., Sweden
fYear :
2000
fDate :
2000
Firstpage :
309
Lastpage :
314
Abstract :
We have studied the role of GaP intermediate layers in GaInP/GaAs double barrier resonant tunnelling structures. Measurements of the current-voltage characteristics show an asymmetric behaviour which was improved in diodes including thicker GaP intermediate layers. From cross-sectional transmission electron microscopy investigations we have observed a fluctuation in the thickness of the GaP layers at the GaInP to GaAs transition to which we attribute the asymmetric characteristics. Finally, we demonstrate a simplified structure using only GaP layers as barriers. These new diodes show more symmetric I-V characteristics than the GaInP/GaAs tunnelling diodes
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; interface states; interface structure; resonant tunnelling diodes; GaAs-based resonant tunnelling diodes; GaInP-GaP-GaAs; GaInP/GaAs double barrier resonant tunnelling structures; GaP; GaP intermediate layers; asymmetric behaviour; cross-sectional transmission electron microscopy; current-voltage characteristics; Chemicals; Current measurement; Diodes; Electrons; Epitaxial growth; Epitaxial layers; Gallium arsenide; Gold; Resonant tunneling devices; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 2000 IEEE International Symposium on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-6258-6
Type :
conf
DOI :
10.1109/ISCS.2000.947174
Filename :
947174
Link To Document :
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