• DocumentCode
    3437409
  • Title

    From Gate-all-Around to Nanowire MOSFETs

  • Author

    Colinge, Jean-Pierre

  • Author_Institution
    Tyndall Nat. Inst., Cork
  • Volume
    1
  • fYear
    2007
  • fDate
    Oct. 15 2007-Sept. 17 2007
  • Firstpage
    11
  • Lastpage
    17
  • Abstract
    The classical MOSFET is reaching its scaling limits and "end-of-roadmap" alternative devices are being investigated. Amongst the different types of SOI devices proposed, one clearly stands out: the multigate field-effect transistor (multigate FET). This device has a general "wire-like" shape. Multigate FETs are commonly referred to as "multi(ple)-gate transistors", "FinFETs", "tri(ple)- gate transistors", "GAA transistors", etc. This paper describes the reasons for evolving from single-gate to multi-gate structures. It also describe some issues in ultra-small devices, such as doping fluctuation effects and quantum confinement effect.
  • Keywords
    MOSFET; doping; nanowires; GAA transistors; doping fluctuation effects; gate-all-around; multigate field-effect transistor; nanowire MOSFET; quantum confinement effect; CMOS technology; Doping; Electrodes; Electrostatics; FETs; FinFETs; MOSFETs; Microprocessors; Semiconductor films; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 2007. CAS 2007. International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4244-0847-4
  • Type

    conf

  • DOI
    10.1109/SMICND.2007.4519637
  • Filename
    4519637