DocumentCode
3437409
Title
From Gate-all-Around to Nanowire MOSFETs
Author
Colinge, Jean-Pierre
Author_Institution
Tyndall Nat. Inst., Cork
Volume
1
fYear
2007
fDate
Oct. 15 2007-Sept. 17 2007
Firstpage
11
Lastpage
17
Abstract
The classical MOSFET is reaching its scaling limits and "end-of-roadmap" alternative devices are being investigated. Amongst the different types of SOI devices proposed, one clearly stands out: the multigate field-effect transistor (multigate FET). This device has a general "wire-like" shape. Multigate FETs are commonly referred to as "multi(ple)-gate transistors", "FinFETs", "tri(ple)- gate transistors", "GAA transistors", etc. This paper describes the reasons for evolving from single-gate to multi-gate structures. It also describe some issues in ultra-small devices, such as doping fluctuation effects and quantum confinement effect.
Keywords
MOSFET; doping; nanowires; GAA transistors; doping fluctuation effects; gate-all-around; multigate field-effect transistor; nanowire MOSFET; quantum confinement effect; CMOS technology; Doping; Electrodes; Electrostatics; FETs; FinFETs; MOSFETs; Microprocessors; Semiconductor films; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2007. CAS 2007. International
Conference_Location
Sinaia
ISSN
1545-827X
Print_ISBN
978-1-4244-0847-4
Type
conf
DOI
10.1109/SMICND.2007.4519637
Filename
4519637
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