DocumentCode :
3437804
Title :
Increasing the ESD protection capability of over-voltage NMOS structures by comb-ballasting region design
Author :
Vashchenko, V.A. ; Concannon, A. ; ter Beek, M. ; Hopper, P.
Author_Institution :
Nat. Semicond. Corp., Santa Clara, CA, USA
fYear :
2003
fDate :
30 March-4 April 2003
Firstpage :
261
Lastpage :
268
Abstract :
The objective of this study is to find a generic design solution for the cascoded snapback NMOS that delivers robust operation and eliminates the requirement for an additional ESD implant. In addition, the research goal of this study is to understand the physical failure mechanism, taking into account the non-linear effects of NMOS snapback, and to provide, at a minimum, a phenomenological explanation of the observed trends resulting from the analysis of Si based experiments.
Keywords :
CMOS integrated circuits; MOSFET; electrostatic discharge; failure analysis; overvoltage protection; semiconductor device breakdown; semiconductor device reliability; semiconductor device testing; 0.18 micron; ESD protection capability; NMOS snapback; Si based experiments; breakdown; cascoded snapback NMOS; comb-ballasting region design; conductivity modulation; generic design solution; nonlinear effects; over-voltage NMOS structures; phenomenological explanation; physical failure mechanism; robust operation; silicided 0.18 μm CMOS technology; triggering; CMOS technology; Conductivity; Electrostatic discharge; Failure analysis; Implants; MOS devices; Protection; Robustness; Substrates; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2003. 41st Annual. 2003 IEEE International
Print_ISBN :
0-7803-7649-8
Type :
conf
DOI :
10.1109/RELPHY.2003.1197755
Filename :
1197755
Link To Document :
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