Impurities in IBAD processes

Impurities in IBAD processes were discussed using radioactivation analysis with thermal neutrons. IBAD processes are useful for hard coatings. In this process, an ion source without a mass separator is normally used. So, contamination by filaments and electrodes is possible but had not been considered. We then studied impurities in Si films deposited with simultaneous Ar or N₂ ion beam irradiation. The samples were activated by thermal neutron irradiation in a reactor to detect γ-ray emission. It was revealed that the electrode contaminated the film but the filament did not. It was also revealed that the atmosphere in the process was contained in the film. Impurities with vapor pressure were reduced with an ion irradiation