Laser interaction with SiCr thin film resistors: "the bubble theory"

Author

Coyne, E.

Author_Institution

Product Anal., Analog Devices, Limerick, Ireland

fYear

2003

fDate

30 March-4 April 2003

Firstpage

553

Lastpage

558

Abstract

This paper introduces a theoretical model to qualitatively describe the mechanisms involved during laser trimming of SiCr thin film resistors. The model was developed to address the problems encountered when trying to cut these resistors. It is based upon the physical laws of laser-matter interaction and extrapolates them to the confines of a thin film resistor. This was achieved with planar TEM images of the laser cut thin film resistors to provide support for the theory. With this model it was then possible to recommend and implement solutions about the design of the SiCr thin film in order to enhance its capabilities as a potential laser trim tab or thin film fuse.

Keywords

bubbles; chromium; failure analysis; laser beam machining; silicon; surface tension; thin film resistors; transmission electron microscopy; SiCr; SiCr thin film resistors; bubble theory; failure analysis techniques; internal pressure; laser cutting; laser interaction; laser trim tab; laser trimming; laser-matter interaction; osmotic pressure; planar TEM images; surface tension; theoretical model; thin film fuse; Absorption; Electric resistance; Laser beam cutting; Laser beams; Laser modes; Laser theory; Optical pulses; Resistors; Thin film circuits; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Reliability Physics Symposium Proceedings, 2003. 41st Annual. 2003 IEEE International

Print_ISBN

0-7803-7649-8

Type

conf

DOI

10.1109/RELPHY.2003.1197807

Filename

1197807