DocumentCode :
3438786
Title :
Analysis of radiation hardness of rear-surface passivated germanium photovoltaic cells
Author :
Hoheisel, Raymond ; Fernandez, Jara ; Dimroth, Frank ; Bett, Andreas W.
Author_Institution :
Fraunhofer ISE, Freiburg, Germany
fYear :
2009
fDate :
7-12 June 2009
Abstract :
In this study the radiation hardness of germanium solar cells is examined. The end-of-life (EOL) irradiation dose corresponds to 1 MeV electrons at a fluence of 1 × 1015 cm-2. Different solar cell technologies are analyzed comprising state-of-the-art Ge solar cells with a highly doped p = 1 × 1017 cm-3 base layer. Additionally, a set of rear-side passivated Ge solar cells with different base layer doping concentrations in the range of p = 1-4 × 1016 cm-3 are investigated. These structures benefit from an increased current-density which results from significantly larger diffusions lengths. Thus, carriers which are generated through the indirect absorption transition deep in the bulk material are able to diffuse to the front-side pn-junction. Measurements are presented showing that the quantum efficiency related to the direct and indirect absorption transition of the Ge solar cell is differently affected by electron irradiation.
Keywords :
doping profiles; electron beam effects; elemental semiconductors; germanium; passivation; semiconductor doping; solar cells; Ge; current density; doping concentrations; electron irradiation; end-of-life irradiation dose; front side p-n junction; germanium photovoltaic cells; germanium solar cells; indirect absorption transition; quantum efficiency; radiation hardness; rear-surface passivation; Germanium; Photovoltaic cells;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE
Conference_Location :
Philadelphia, PA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-2949-3
Electronic_ISBN :
0160-8371
Type :
conf
DOI :
10.1109/PVSC.2009.5411151
Filename :
5411151
Link To Document :
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