Optical and Microstructural Properties of Sol-Gel TiOxNy Thin Films

Author

Trapalis, Chr ; Giannakopoulou, T. ; Todorova, N. ; Anastasescu, C. ; Anastasescu, M. ; Gartner, M.

Author_Institution

Inst. of Mater. Sci., NCSR "Demokritos", Athens

Volume

2

fYear

2007

fDate

Oct. 15 2007-Sept. 17 2007

Firstpage

303

Lastpage

306

Abstract

Titanium oxynitride thin films were deposited by sol-gel method on quartz substrate in an attempt to study the microstructural and optical properties of TiO_xN_y films deposited by sol-gel method. For this purpose, X-ray diffraction (XRD), atomic force microscopy (AFM), and spectroscopic ellipsometry (SE) investigations were performed. Examining the surface morphology and grain sizes of the films, complex nanostructured surfaces, with a mean cluster size in the range of 20-30 nm were obtained in connection with the preparation method. Regarding their optical properties, it was found a decrease of the optical band gap of N-doped TiO₂ films down to the visible range.

Keywords

X-ray diffraction; atomic force microscopy; grain size; optical constants; sol-gel processing; surface morphology; thin films; titanium compounds; TiON; X-ray diffraction; atomic force microscopy; grain size; mean cluster size; optical band gap; quartz substrate; sol-gel method; surface morphology; thin films; Atom optics; Atomic force microscopy; Atomic layer deposition; Optical diffraction; Optical films; Sputtering; Surface morphology; Titanium; X-ray diffraction; X-ray scattering; AFM; N-doped TiO2; SE; sol-gel;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2007. CAS 2007. International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-4244-0847-4

Type

conf

DOI

10.1109/SMICND.2007.4519720

Filename

4519720