Title :
Drain avalanche breakdown and gate instabilities in 4H-SiC MESFETs
Author :
Lv, Hongliang ; Zhang, Yimen ; Zhang, Yuming
Author_Institution :
Microelectron. Inst., Xidian Univ., Xi´´an, China
fDate :
30 March-4 April 2003
Abstract :
With a 2-D numerical simulator, avalanche breakdown in 4H-SiC MESFETs with a recessed-gate structure has been studied. The breakdown voltage of the 4H-SiC MESFET is determined by impact ionization as well as conductivity modulation. The dependence of the breakdown voltage on gate bias is due to the change of the electric field distribution. A thermal model must be included to take the self-thermal effects into account and a positive coefficient of breakdown voltage is obtained. The anisotropy parameters are included into the model for the first time and the orientation dependence of the breakdown characteristics is explained.
Keywords :
Schottky gate field effect transistors; avalanche breakdown; impact ionisation; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; silicon compounds; temperature distribution; wide band gap semiconductors; 2-D numerical simulator; 4H-SiC MESFETs; SiC; anisotropy parameters; breakdown voltage; conductivity modulation; drain avalanche breakdown; electric field distribution; electron concentration; gate bias dependence; gate instabilities; hole concentration; impact ionization; orientation dependence; positive coefficient of breakdown voltage; recessed-gate structure; self-thermal effects; thermal model; Anisotropic magnetoresistance; Avalanche breakdown; Charge carrier processes; Electric breakdown; Epitaxial layers; Impact ionization; MESFETs; Microelectronics; Numerical simulation; Thermal conductivity;
Conference_Titel :
Reliability Physics Symposium Proceedings, 2003. 41st Annual. 2003 IEEE International
Print_ISBN :
0-7803-7649-8
DOI :
10.1109/RELPHY.2003.1197812