DocumentCode :
3439296
Title :
Highly-transparent ZnO:Ga through rapid thermal annealing for low-bandgap solar cell application
Author :
Jia, Haijun ; Matsui, Takuya ; Kondo, Michio
Author_Institution :
Res. Center for Photovoltaics (RCPVs), Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
fYear :
2009
fDate :
7-12 June 2009
Abstract :
Textured Ga doped ZnO (GZO) films showing strong light trapping ability were prepared at room temperature. Rapid thermal annealing of the textured-GZO films at elevated temperatures was found to be effective to significantly improve their optical transmission without deteriorating the film conductivity. By applying the annealed GZO films to the microcrystalline Si1-xGex (x=0.1) single junction solar cells, an obvious enhancement in the spectral response is achieved. The resulted rather high short-circuit current density (>25.5 mA/cm2) for ~1.1 ¿m absorber layer together with the unaffected open-circuit voltage and fill factor leads to an state-of-art conversion efficiency of 8.2 %.
Keywords :
Ge-Si alloys; II-VI semiconductors; current density; gallium; light transmission; rapid thermal annealing; solar cells; wide band gap semiconductors; zinc compounds; Si0.9Ge0.1; ZnO:Ga; light trapping; low band gap solar cell; microcrystalline single junction solar cells; optical transmission; rapid thermal annealing; short circuit current density; spectral response; temperature 293 K to 298 K; textured Ga doped films; Conductive films; Current density; Optical films; Photovoltaic cells; Rapid thermal annealing; Semiconductor films; Temperature; Thermal conductivity; Voltage; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE
Conference_Location :
Philadelphia, PA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-2949-3
Electronic_ISBN :
0160-8371
Type :
conf
DOI :
10.1109/PVSC.2009.5411175
Filename :
5411175
Link To Document :
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