Title :
A novel method to form nano-gridlines on textured CZ silicon wafers
Author :
Xu, Li ; Borden, P.G. ; Stewart, Michael P. ; Paak, Steve
Author_Institution :
Appl. Mater. Solar Bus. Group, Santa Clara, CA, USA
Abstract :
We report a novel method to form metal nano-gridlines on textured Czochralski (CZ) silicon. This involves the deposition of tensile stressed silicon nitride under conditions that cause cracks at the base of the pyramid features. The crack width is adjusted with buffered BHF and the opening is self-aligned with the nitride as a mask. Subsequently, the metal lines are plated within the cracks, forming conductors with submicron dimensions. The metal grid provides a conduction path parallel to the emitter, relaxing sheet resistance requirements for a diffused emitter.
Keywords :
crystal growth from melt; diffusion; electroplating; elemental semiconductors; masks; nanostructured materials; silicon; silicon compounds; solar cells; surface cracks; surface texture; Si; Si-SiN; conduction path; cracks; diffused emitter; mask; metal grid; metal lines; nanogridlines; plating; pyramid features; self-alignment; sheet resistance; solar cells; tensile stressed silicon nitride deposition; textured Czochralski silicon wafers; Conductive films; Conductivity; Electrodes; Epitaxial growth; Glass; Molecular beam epitaxial growth; Silicon; Substrates; Transistors; X-ray scattering;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE
Conference_Location :
Philadelphia, PA
Print_ISBN :
978-1-4244-2949-3
Electronic_ISBN :
0160-8371
DOI :
10.1109/PVSC.2009.5411184
