DocumentCode :
3440695
Title :
Scale-up and manufacturing expansion of low-cost amorphous silicon solar panels at EPV SOLAR
Author :
Han, Sijin ; Jansen, Kai W. ; Brazil, Mike ; Steiger, Richard ; French, Scott ; Iafelice, V. ; Varvar, Anthony ; Fabiano, Paul ; Stucky, Dennis ; Malocsay, Eric ; Stavrides, Alex ; Delahoy, Alan E.
Author_Institution :
EPV SOLAR, Inc., Robbinsville, NJ, USA
fYear :
2009
fDate :
7-12 June 2009
Abstract :
To meet the aggressive growth of the world-wide photovoltaic market of the past several years, EPV SOLAR has further developed its technology, reduced its manufacturing costs, and expanded its production capacity in the US and Europe. EPV SOLAR currently has three manufacturing plants, located in Lawrenceville and Robbinsville, New Jersey, USA, and Senftenberg, Brandenburg, Germany. With the introduction of the EPV SOLAR Generation VI Plasma Enhanced Chemical Vapor Deposition (PECVD) systems, the development of low-cost advanced sputtering systems, and the integration of improved support equipment, the two plants, in Robbinsville and Senftenberg, have ramped their installed capacity to 50 MW/yr; an order of magnitude higher capacity than previously attained. As a result of the development of new process and equipment technology, the rated power of EPV modules has increased from 42 W to 56 W, through an increase in substrate size from 0.79 m2 to 0.94 m2, the optimization of the a-Si device structure and deposition uniformity, implementing improved laser scribing processes, identifying and reducing the incidence of shunting, and incorporating a high reflectivity zinc oxide back reflector to enhance long wavelength quantum efficiency. Advanced diagnostics tools have been developed for improved process control, which have led to improved a-Si thickness uniformity and higher material stability. Development of infrared imaging techniques have proven their value in troubleshooting shunting problems and have led to improved module fabrication processes. Proprietary laser scribing processes have resulted in the development of unique building-integrated photovoltaic (BIPV) products.
Keywords :
amorphous semiconductors; elemental semiconductors; infrared imaging; plasma CVD; silicon; solar cells; Brandenburg; EPV SOLAR Generation VI; Europe; Germany; Lawrenceville; New Jersey; Robbinsville; Senftenberg; Si; US; amorphous silicon solar panels; building integrated photovoltaic products; infrared imaging; laser scribing process; manufacturing expansion; photovoltaic market; plasma enhanced chemical vapor deposition; scale-up expansion; Amorphous silicon; Building integrated photovoltaics; Chemical technology; Costs; Europe; Manufacturing; Photovoltaic systems; Plasma chemistry; Production; Solar power generation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE
Conference_Location :
Philadelphia, PA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-2949-3
Electronic_ISBN :
0160-8371
Type :
conf
DOI :
10.1109/PVSC.2009.5411240
Filename :
5411240
Link To Document :
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