DocumentCode :
3442031
Title :
Iddq testing for high performance CMOS-the next ten years
Author :
Williams, T.W. ; Kapur, R. ; Mercer, M.R. ; Dennard, R.H. ; Maly, W.
Author_Institution :
IBM Corp., Boulder, CO, USA
fYear :
1996
fDate :
11-14 Mar 1996
Firstpage :
578
Lastpage :
583
Abstract :
CMOS scaling affects the subthreshold current per IC, and it directly impacts the utility of Iddq testing for CMOS devices. Continued IC manufacturing refinements enable a factor of √2 reduction in line widths every three years. This in conjunction with an increase in chip size makes it possible to increase the number of transistors per IC by a factor between two and three. This trend in CMOS technology is expected to continue over at least the next ten years. The scaling of devices affects numerous device parameters, one being the subthreshold current commonly known as the leakage current. Assuming defect size scales with technology, it will be explained why it will become increasingly difficult to differentiate good and defective devices based upon an Iddq test methodology
Keywords :
CMOS integrated circuits; integrated circuit testing; leakage currents; production testing; technological forecasting; CMOS scaling; Iddq testing; device parameters; high performance CMOS; leakage current; line widths; manufacturing refinements; subthreshold current; test methodology; CMOS integrated circuits; CMOS technology; Integrated circuit testing; Leak detection; Leakage current; Manufacturing; Power supplies; Refining; Subthreshold current; USA Councils;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
European Design and Test Conference, 1996. ED&TC 96. Proceedings
Conference_Location :
Paris
ISSN :
1066-1409
Print_ISBN :
0-8186-7424-5
Type :
conf
DOI :
10.1109/EDTC.1996.494359
Filename :
494359
Link To Document :
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