Title :
A novel nonvolatile memory with spin torque transfer magnetization switching: spin-ram
Author :
Hosomi, M. ; Yamagishi, H. ; Yamamoto, T. ; Bessho, K. ; Higo, Y. ; Yamane, K. ; Yamada, H. ; Shoji, M. ; Hachino, H. ; Fukumoto, C. ; Nagao, H. ; Kano, H.
Author_Institution :
Sony Corp., Kanagawa
Abstract :
A novel nonvolatile memory utilizing spin torque transfer magnetization switching (STS), abbreviated spin-RAM hereafter, is presented for the first time. The spin-RAM is programmed by magnetization reversal through an interaction of a spin momentum-torque-transferred current and a magnetic moment of memory layers in magnetic tunnel junctions (MTJs), and therefore an external magnetic field is unnecessary as that for a conventional MRAM. This new programming mode has been accomplished owing to our tailored MTJ, which has an oval shape of 100 times 150 nm. The memory cell is based on a 1-transistor and a 1-MTJ (ITU) structure. The 4kbit spin-RAM was fabricated on a 4 level metal, 0.18 mum CMOS process. In this work, writing speed as high as 2 ns, and a write current as low as 200 muA were successfully demonstrated. It has been proved that spin-RAM possesses outstanding characteristics such as high speed, low power and high scalability for the next generation universal memory
Keywords :
low-power electronics; magnetic recording; magnetic tunnelling; magnetisation reversal; random-access storage; 0.18 micron; 100 nm; 150 nm; CMOS process; magnetic field; magnetic moment; magnetic tunnel junctions; magnetization reversal; nonvolatile memory; spin torque transfer magnetization switching; spin-RAM; universal memory; CMOS process; Magnetic fields; Magnetic moments; Magnetic switching; Magnetic tunneling; Magnetization reversal; Nonvolatile memory; Shape; Sociotechnical systems; Torque;
Conference_Titel :
Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-9268-X
DOI :
10.1109/IEDM.2005.1609379